Structural and mechanical properties of room temperature sputter deposited CrN coatings


Autoria(s): Raman, Thulasi KH; Kiran, MSRN; Ramamurty, U; Rao, Mohan G
Data(s)

2012

Resumo

Chromium nitride (CrN) thin films were deposited at room temperature on silicon and glass substrates using DC reactive magnetron sputtering in Ar + N-2 plasma. Structure and mechanical properties of these films were examined by using XRD, FESEM and nanoindentation techniques. XRD studies revealed that films are of mixed phase at lower nitrogen partial pressure (P-N2) and single phase at higher (P-N2). Microscopy results show that the films were composed of non-equiaxed columns with nanocrystallite morphology. The hardness and elastic modulus of the films increase with increasing nitrogen partial pressure (P-N2). A maximum hardness of similar to 29 GPa and elastic modulus of 341 GPa were obtained, which make these films useful for several potential applications. (C) 2012 Elsevier Ltd. All rights reserved.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/45868/1/mat_res_bul_47-12_4463_2012.pdf

Raman, Thulasi KH and Kiran, MSRN and Ramamurty, U and Rao, Mohan G (2012) Structural and mechanical properties of room temperature sputter deposited CrN coatings. In: MATERIALS RESEARCH BULLETIN, 47 (12). pp. 4463-4466.

Publicador

PERGAMON-ELSEVIER SCIENCE LTD

Relação

http://dx.doi.org/10.1016/j.materresbull.2012.09.051

http://eprints.iisc.ernet.in/45868/

Palavras-Chave #Materials Engineering (formerly Metallurgy) #Instrumentation and Applied Physics (Formally ISU)
Tipo

Journal Article

PeerReviewed