Non-thermal plasma applications at Very Low Temperature


Autoria(s): Mizuno, A; Rajanikanth, BS; Shimizu, K; Kinoshita, K; Yanagihara, K; Okumoto, M; Katsura, S
Data(s)

1995

Resumo

Application of non-thermal plasma for gas cleaning is gaining prominence in the recent years. Normally, the gas treatment was carried out at or above room temperature, by the dry type plasma reactor. However, this treatment is still inadequate in the removal of certain stable gases present in the flue gas mixture. We propose the non-thermal plasma process at very low temperature, and report here some interesting results of treatment of NO or N2O with pulsed plasma below — 100°C ambient temperature. Direct methanol synthesis from CH4 and CO2 at very low temperature is also reported. A comparative analysis of the various tests are presented together with a note on the energy consideration

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/44136/1/00102209808952026.pdf

Mizuno, A and Rajanikanth, BS and Shimizu, K and Kinoshita, K and Yanagihara, K and Okumoto, M and Katsura, S (1995) Non-thermal plasma applications at Very Low Temperature. In: Combustion Science and Technology , 133 (1-3). pp. 49-63.

Relação

http://www.tandfonline.com/doi/abs/10.1080/00102209808952026#preview

http://eprints.iisc.ernet.in/44136/

Palavras-Chave #Electrical Engineering
Tipo

Journal Article

PeerReviewed