Band alignment studies in InN/p-Si(100) heterojunctions by x-ray photoelectron spectroscopy


Autoria(s): Bhat, Thirumaleshwara N; Kumar, Mahesh; Rajpalke, Mohana K; Roul, Basanta; Krupanidhi, SB; Sinha, Neeraj
Data(s)

2011

Resumo

The band offsets in InN/p-Si heterojunctions are determined by high resolution x-ray photoemission spectroscopy. The valence band of InN is found to be 1.39 eV below that of Si. Given the bandgap of 0.7 eV for InN, a type-III heterojunction with a conduction band offset of 1.81 eV was found. Agreement between the simulated and experimental data obtained from the heterojunction spectra was found to be excellent, establishing that the method of determination was accurate. The charge neutrality level (CNL) model provided a reasonable description of the band alignment of the InN/p-Si interface and a change in the interface dipole by 0.06 eV was observed for InN/p-Si interface.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/43000/1/Band_alignment.pdf

Bhat, Thirumaleshwara N and Kumar, Mahesh and Rajpalke, Mohana K and Roul, Basanta and Krupanidhi, SB and Sinha, Neeraj (2011) Band alignment studies in InN/p-Si(100) heterojunctions by x-ray photoelectron spectroscopy. In: Journal of Applied Physics, 109 (12). p. 123707.

Publicador

American Institute of Physics

Relação

http://jap.aip.org/resource/1/japiau/v109/i12/p123707_s1

http://eprints.iisc.ernet.in/43000/

Palavras-Chave #Materials Research Centre
Tipo

Journal Article

PeerReviewed