Reactive pulsed laser deposition and characterization of niobium nitride thin films
Data(s) |
15/12/2011
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Resumo |
We present a systematic study to explore the effect of important process variables on the composition and structure of niobium nitride thin films synthesized by Reactive Pulsed Laser Deposition (RPLD) technique through ablation of high purity niobium target in the presence of low pressure nitrogen gas. Secondary Ion Mass Spectrometry has been used in a unique way to study and fix gas pressure, substrate temperature and laser fluence, in order to obtain optimized conditions for one variable in single experimental run. The x-ray diffraction and electron microscopic characterization have been complemented by proton elastic backscattering spectroscopy and x-ray photoelectron spectroscopy to understand the incorporation of oxygen and associated non-stoichiometry in the metal to nitrogen ratio. The present study demonstrates that RPLD can be used for obtaining thin film architectures using non-equilibrium processing. Finally the optimized NbN thin films were characterized for their hardness using nano-indentation technique and found to be similar to 30 GPa at the deposition pressure of 8 Pa. (C) 2011 Elsevier B.V. All rights reserved. |
Formato |
application/pdf |
Identificador |
http://eprints.iisc.ernet.in/42959/1/Reactive.pdf Krishnan, R and David, C and Ajikumar, PK and Dash, S and Tyagi, AK and Jayaram, V and Raj, Baldev (2011) Reactive pulsed laser deposition and characterization of niobium nitride thin films. In: Surface and Coatings Technology, 206 (6). pp. 1196-1202. |
Publicador |
Elsevier Science |
Relação |
http://dx.doi.org/10.1016/j.surfcoat.2011.08.028 http://eprints.iisc.ernet.in/42959/ |
Palavras-Chave | #Materials Engineering (formerly Metallurgy) |
Tipo |
Journal Article PeerReviewed |