Surface effects on stacking fault and twin formation in fcc nanofilms: A first-principles study


Autoria(s): Datta, A; Srirangarajan, A; Waghmare, UV; Ramamurty, U; To, AC
Data(s)

01/12/2011

Resumo

The free surface effects on stacking fault and twin formation in fcc metals (Al, Cu, and Ni) were examined by first-principles calculations based on density functional theory (DFT). It is found that the generalized planar fault (GPF) energies of Ni are much larger than bulk Ni with respect to Al and Cu. The discrepancy is attributed to the localized relaxation of Ni nanofilm to accommodate the large expansion of the inter-planar separation induced at the fault plane. The localized relaxation can be coupled to the electronic structure of Ni nanofilms. (C) 2011 Elsevier B.V. All rights reserved.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/41625/1/Surface_effects.pdf

Datta, A and Srirangarajan, A and Waghmare, UV and Ramamurty, U and To, AC (2011) Surface effects on stacking fault and twin formation in fcc nanofilms: A first-principles study. In: Computational Materials Science, 50 (12). pp. 3342-3345.

Publicador

Elsevier Science

Relação

http://dx.doi.org/10.1016/j.commatsci.2011.06.026

http://eprints.iisc.ernet.in/41625/

Palavras-Chave #Materials Engineering (formerly Metallurgy)
Tipo

Journal Article

PeerReviewed