Tantalum oxide films prepared by unbalanced reactive magnetron sputtering


Autoria(s): Rao, Rama N; Chandramani, R; Rao, Mohan G
Data(s)

01/12/1999

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/38839/1/Tantalum_oxide_films_prepared.pdf

Rao, Rama N and Chandramani, R and Rao, Mohan G (1999) Tantalum oxide films prepared by unbalanced reactive magnetron sputtering. In: Journal of Materials Science Letters, 18 (23). pp. 1949-1951.

Publicador

Springer

Relação

http://www.springerlink.com/content/nq33w5j07814139t/

http://eprints.iisc.ernet.in/38839/

Palavras-Chave #Instrumentation and Applied Physics (Formally ISU)
Tipo

Journal Article

PeerReviewed