Tantalum oxide films prepared by unbalanced reactive magnetron sputtering
Data(s) |
01/12/1999
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Formato |
application/pdf |
Identificador |
http://eprints.iisc.ernet.in/38839/1/Tantalum_oxide_films_prepared.pdf Rao, Rama N and Chandramani, R and Rao, Mohan G (1999) Tantalum oxide films prepared by unbalanced reactive magnetron sputtering. In: Journal of Materials Science Letters, 18 (23). pp. 1949-1951. |
Publicador |
Springer |
Relação |
http://www.springerlink.com/content/nq33w5j07814139t/ http://eprints.iisc.ernet.in/38839/ |
Palavras-Chave | #Instrumentation and Applied Physics (Formally ISU) |
Tipo |
Journal Article PeerReviewed |