Antiferroelectric lead zirconate thin films by pulsed laser ablation


Autoria(s): Bharadwaja, SSN; Krupanidhi, SB
Data(s)

15/09/1999

Resumo

Lead Zirconate (PbZrO3) thin films were deposited by pulsed laser ablation method. Pseudocubic (110) oriented in-situ films were grown at low pressure. The field enforced anti-ferroelectric (AFE) to ferroelectric (FE) phase transformation behaviour was investigated by means of a modified Sawyer Tower circuit as well as capacitance versus applied voltage measurements. The maximum polarisation obtained was 36 mu C cm(-2) and the critical field to induce ferroelectric state and to reverse the antiferroelectric slates were 65 and 90 kV cm(-1) respectively. The dielectric properties were investigated as a function of frequency and temperature. The dielectric constant of the AFE lead zirconate thin him was 190 at 100 kHz which is more than the bulk ceramic value (120) with a dissipation factor of less than 0.07. The polarisation switching kinetics of the antiferroelectric PbZrO3 thin films showed that the switching time to be around 275 ns between antipolar state to polar states. (C) 1999 Elsevier Science S.A. All rights reserved.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/38579/1/Antiferroelectric_lead_zirconate.pdf

Bharadwaja, SSN and Krupanidhi, SB (1999) Antiferroelectric lead zirconate thin films by pulsed laser ablation. In: Materials Science and Engineering B, 64 (1). 54-59 .

Publicador

Elsevier Science

Relação

http://dx.doi.org/10.1016/S0921-5107(99)00163-4

http://eprints.iisc.ernet.in/38579/

Palavras-Chave #Materials Research Centre
Tipo

Journal Article

PeerReviewed