Si, Si-Ge and the new heterostructure world
Data(s) |
10/12/1994
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Resumo |
Semiconductor heterostructures based on AlAs/GaAs and other III-V compounds have been the focus of active research for some time now. Ih the last decade, a new heterostructure material, the strained Si/SiGe system, has emerged. This heterojunction technology can potentially be integrated into the current VLSI environment with large-scale impact in the growing microelectronics market. Si/SiGe heterojunction bipolar transistors with cut-off frequencies exceeding 100 GHz and other electronic and optical devices with superior properties compared to all-Si technology have been demonstrated in laboratories worldwide. |
Formato |
application/pdf |
Identificador |
http://eprints.iisc.ernet.in/36802/1/855%2B.pdf Venkataramani, V (1994) Si, Si-Ge and the new heterostructure world. In: Current Science (Bangalore), 67 (11). 855-858 . |
Publicador |
Indian academy of sciences |
Relação |
http://www.ias.ac.in/j_archive/currsci/67/vol67contents.html http://eprints.iisc.ernet.in/36802/ |
Palavras-Chave | #Physics |
Tipo |
Journal Article PeerReviewed |