Si, Si-Ge and the new heterostructure world


Autoria(s): Venkataramani, V
Data(s)

10/12/1994

Resumo

Semiconductor heterostructures based on AlAs/GaAs and other III-V compounds have been the focus of active research for some time now. Ih the last decade, a new heterostructure material, the strained Si/SiGe system, has emerged. This heterojunction technology can potentially be integrated into the current VLSI environment with large-scale impact in the growing microelectronics market. Si/SiGe heterojunction bipolar transistors with cut-off frequencies exceeding 100 GHz and other electronic and optical devices with superior properties compared to all-Si technology have been demonstrated in laboratories worldwide.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/36802/1/855%2B.pdf

Venkataramani, V (1994) Si, Si-Ge and the new heterostructure world. In: Current Science (Bangalore), 67 (11). 855-858 .

Publicador

Indian academy of sciences

Relação

http://www.ias.ac.in/j_archive/currsci/67/vol67contents.html

http://eprints.iisc.ernet.in/36802/

Palavras-Chave #Physics
Tipo

Journal Article

PeerReviewed