Negative differential capacitance in n-GaN/p-Si heterojunctions


Autoria(s): Kumar, Mahesh; Bhat, Thirumaleshwara N; Rajpalke, Mohana K; Roul, Basanta; Sinha, Neeraj; Kalghatgi, AT; Krupanidhi, SB
Data(s)

01/03/2011

Resumo

Negative differential capacitance (NDC) has been observed in n-GaN/p-Si heterojunctions grown by plasma assisted molecular beam epitaxy (PAMBE). The NDC is observed at low frequencies 1 and 10 kilohertz (kHz) and disappeared at a higher testing frequency of 100 kHz. The NDC is also studied with temperature and found that it has disappeared above 323 degrees C. Current-Voltage (I-V) characteristics of n-GaN /p-Si heterojunction were measured at different temperatures and are attributed to the space-charge-limited current (SCLC). A simple model involving two quantum states is proposed to explain the observed NDC behavior. (C) 2010 Elsevier Ltd. All rights reserved.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/35973/1/Negative.pdf

Kumar, Mahesh and Bhat, Thirumaleshwara N and Rajpalke, Mohana K and Roul, Basanta and Sinha, Neeraj and Kalghatgi, AT and Krupanidhi, SB (2011) Negative differential capacitance in n-GaN/p-Si heterojunctions. In: Solid State Communications, 151 (5). pp. 356-359.

Publicador

Elsevier Science

Relação

http://dx.doi.org/10.1016/j.ssc.2010.12.023

http://eprints.iisc.ernet.in/35973/

Palavras-Chave #Materials Research Centre
Tipo

Journal Article

PeerReviewed