Epitaxial metallic LaNiO3 thin films grown by pulsed laser deposition
| Data(s) |
15/03/1993
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|---|---|
| Resumo |
Epitaxial LaNiO3(LNO) thin films on LaAlO3(LAO), SrTiO3(STO), and YSZ are grown by pulsed laser deposition method at 350 mTorr oxygen partial pressure and 700 °C substrate temperature. As‐deposited LNO films are metallic down to 10 K. c‐axis oriented YBa2Cu3O7 (YBCO) films were grown on LNO/LAO as well as LNO/STO surfaces without affecting superconducting transition temperature of YBCO. Textured LNO thin films were grown on c‐axis oriented YBCO/STO and YBCO/YSZ . Transport measurements of these bilayer films showed that LNO is a good metallic contact material for YBCO. |
| Formato |
application/pdf |
| Identificador |
http://eprints.iisc.ernet.in/35455/1/Epitaxi.pdf Satyalakshmi, KM and Mallya, RM and Ramanathan, KV and Wu, XD and Brainard, B and Gautier, DC and Vasanthacharya, NY and Hegde, MS (1993) Epitaxial metallic LaNiO3 thin films grown by pulsed laser deposition. In: Applied Physics Letters, 62 (11). pp. 1233-1235. |
| Publicador |
American Institute of Physics |
| Relação |
http://apl.aip.org/resource/1/applab/v62/i11/p1233_s1 http://eprints.iisc.ernet.in/35455/ |
| Palavras-Chave | #Materials Research Centre #Materials Engineering (formerly Metallurgy) |
| Tipo |
Journal Article PeerReviewed |
