Effect of substrate temperature on the properties of ZrO2 films prepared by d.c. reactive magnetron sputtering


Autoria(s): Suhail, MH; Rao, Mohan G; Mohan, S
Data(s)

01/02/1992

Resumo

Studies of ZrO2 films prepared by d.c. reactive magnetron sputtering are described. The effects of substrate temperature on the packing density, refractive index, extinction coefficient and crystallinity phase have been investigated in the temperature range 25–450 °C. The refractive index varied from 1.84 to 1.95 and extinction coefficient from 2 × 10−3 to 9.6 × 10−3. This was explained on the basis of an increase in packing density from 0.686 to 0.813. The change in packing density has been attributed to a decrease in the oxygen condensation at higher temperatures. Annealing results in a decrease in refractive index and increase in extinction coefficient. The films deposited at 150 °C showed a monoclinic phase which transforms to a tetragonal phase at higher substrate temperatures.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/35203/1/Effect_of_substrate_temperature_on_the_properties_of_ZrO_2_films.pdf

Suhail, MH and Rao, Mohan G and Mohan, S (1992) Effect of substrate temperature on the properties of ZrO2 films prepared by d.c. reactive magnetron sputtering. In: Materials Science and Engineering: B, 12 (3). pp. 247-251.

Publicador

Elsevier science

Relação

http://dx.doi.org/10.1016/0921-5107(92)90295-K

http://eprints.iisc.ernet.in/35203/

Palavras-Chave #Instrumentation and Applied Physics (Formally ISU)
Tipo

Journal Article

PeerReviewed