Anisotropic properties of the layered semiconductor in Te


Autoria(s): Pal, S; Bose, DN; Asokan , S; Gopal, ESR
Data(s)

01/12/1991

Resumo

Anisotropic properties of the Bridgman grown layered semiconductor p-InTe were studied by analyzing the temperature dependence of electrical conductivity and Hall mobility parallel and perpendicular to the layer planes. The mobilities were μamalgamation or coproduct = 50–60 cm2V−1 sec−1 and μperpendicular = 10–15 cm2V−1sec−1 and varied as μ ≈ Tn where n = 1.43 due to impurity scattering. Pressure-induced semiconductor-metal transition occurred at about 50 kbar. The pressure coefficient of resistance was 3 times larger in the direction perpendicular to the layer plane due to the difference between inter and intra-planar bonding.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/33625/1/ANISOTROPIC_PROPERTIES_OF_THE_LAYERED_SEMICONDUCTOR.pdf

Pal, S and Bose, DN and Asokan , S and Gopal, ESR (1991) Anisotropic properties of the layered semiconductor in Te. In: Solid State Communications, 80 (9). pp. 753-756.

Publicador

Elsevier science

Relação

http://dx.doi.org/10.1016/0038-1098(91)90902-8

http://eprints.iisc.ernet.in/33625/

Palavras-Chave #Instrumentation and Applied Physics (Formally ISU)
Tipo

Journal Article

PeerReviewed