Characterization of compact ICP ion source for focused ion beam applications


Autoria(s): Nabhiraj, PY; Menon, Ranjini; Rao, Mohan G; Mohan, S; Bhandari, RK
Data(s)

01/09/2010

Resumo

A compact, high brightness 13.56 MHz inductively coupled plasma ion source without any axial or radial multicusp magnetic fields is designed for the production of a focused ion beam. Argon ion current of density more than 30 mA/cm(2) at 4 kV potential is extracted from this ion source and is characterized by measuring the ion energy spread and brightness. Ion energy spread is measured by a variable-focusing retarding field energy analyzer that minimizes the errors due t divergence of ion beam inside the analyzer. Brightness of the ion beam is determined from the emittance measured by a fully automated and locally developed electrostatic sweep scanner. By optimizing various ion source parameters such as RF power, gas pressure and Faraday shield, ion beams with energy spread of less than 5 eV and brightness of 7100 Am(-2)sr(-1)eV(-1) have been produced. Here, we briefly report the details of the ion source, measurement and optimization of energy spread and brightness of the ion beam. (C) 2010 Elsevier B.V. All rights reserved.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/32121/1/icp.pdf

Nabhiraj, PY and Menon, Ranjini and Rao, Mohan G and Mohan, S and Bhandari, RK (2010) Characterization of compact ICP ion source for focused ion beam applications. In: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 621 (1-3). pp. 57-61.

Publicador

Elsevier Science

Relação

http://dx.doi.org/10.1016/j.nima.2010.04.069

http://eprints.iisc.ernet.in/32121/

Palavras-Chave #Instrumentation and Applied Physics (Formally ISU)
Tipo

Journal Article

PeerReviewed