Influence of substrate temperature and post-deposition heat treatment on the optical properties of SiO2 films


Autoria(s): Rao, Narasimha K; Mohan, S
Data(s)

15/03/1989

Resumo

Silicon dioxide films are extensively used as protective, barrier and also low index films in multilayer optical devices. In this paper, the optical properties of electron beam evaporated SiO2 films, including absorption in the UV, visible and IR regions, are reported as a function of substrate temperature and post-deposition heat treatment. A comparative study of the optical properties of SiO2 films deposited in neutral and ionized oxygen is also made.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/31518/1/influ.pdf

Rao, Narasimha K and Mohan, S (1989) Influence of substrate temperature and post-deposition heat treatment on the optical properties of SiO2 films. In: Thin Solid Films, 170 (2). pp. 179-184.

Publicador

Elsevier Science

Relação

http://dx.doi.org/10.1016/0040-6090(89)90722-0

http://eprints.iisc.ernet.in/31518/

Palavras-Chave #Instrumentation and Applied Physics (Formally ISU)
Tipo

Journal Article

PeerReviewed