Electrophoretic deposition of Ti3Si(Al)C2 from aqueous suspension
| Data(s) |
24/03/2010
|
|---|---|
| Resumo |
Ti3Si(Al)C2 films were electrophoretically deposited at 3 V on indium-tin-oxide (ITO) conductive glass from Ti3Si(Al) C2 aqueous suspension with 1 vol% solid loading at pH 9 in the absence of any dispersant. The surface morphology, cross section microstructure, and preferred orientation of the films were investigated by scanning electron microscopy and X-ray diffraction. The as-deposited Ti3Si(Al)C 2 films exhibited (00l) preferred orientation and the thickness can be controlled by the deposition-drying-deposition method. These results demonstrate that electrophoretic deposition is a simple and feasible method to prepare MAX-phases green films at room temperature. |
| Identificador | |
| Publicador |
American Chemical Society |
| Relação |
http://onlinelibrary.wiley.com/doi/10.1111/j.1551-2916.2010.03682.x/abstract DOI:10.1111/j.1551-2916.2010.03682.x Liang, Y., Sun, Ziqi, Chen, J., Liu, X., & Zhou, Y. (2010) Electrophoretic deposition of Ti3Si(Al)C2 from aqueous suspension. Journal of the American Chemical Society, 93(7), pp. 1916-1921. |
| Direitos |
Copyright 2010 American Chemical Society |
| Fonte |
School of Chemistry, Physics & Mechanical Engineering; Science & Engineering Faculty |
| Tipo |
Journal Article |
