Electrical transport in Bi doped n-type amorphous semiconductors (GeSe3.5)100-xBix at high pressure


Autoria(s): Bhatia, KL; Parthasarathy, G; Gopal, ESR
Data(s)

01/12/1983

Resumo

Electrical transport in Bi doped amorphous semiconductors (GeSe3.5)100-xBix (x=0,4,10) is studied in a Bridgman anvil system up to a pressure of 90 kbar and down to 77 K. A pressure induced continuous transition from an amorphous semiconductor to a metal-like solid is observed in GeSe3.5. The addition of Bi disturbs significantly the behaviour of resistivity with pressure. The results are discussed in the light of molecular cluster model for GeySe1-y proposed by Phillips.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/24085/1/21.pdf

Bhatia, KL and Parthasarathy, G and Gopal, ESR (1983) Electrical transport in Bi doped n-type amorphous semiconductors (GeSe3.5)100-xBix at high pressure. In: Journal of Non-Crystalline Solids, 59-60 (2). pp. 1019-1021.

Publicador

Elsevier science

Relação

http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TXM-48CXRM9-24J&_user=512776&_rdoc=1&_fmt=&_orig=search&_sort=d&_docanchor=&view=c&_acct=C000025298&_version=1&_urlVersion=0&_userid=512776&md5=8ef320c6c7b9db2fd0b9deac2fafea6f

http://eprints.iisc.ernet.in/24085/

Palavras-Chave #Physics
Tipo

Journal Article

PeerReviewed