Approximate solution for the redistribution of impurities during second oxidation


Autoria(s): Chakrabarti, Utpal K
Data(s)

01/08/1975

Resumo

The impurity profile for the second oxidation, used in MOST fabrication, has been obtained by Margalit et al. [1]. The disadvantage of this technique is that the accuracy of their solution is directly dependent on the computer time. In this article, an analytical solution is presented using the approximation of linearizing the second oxidation procedure.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/24036/1/getPDF.pdf

Chakrabarti, Utpal K (1975) Approximate solution for the redistribution of impurities during second oxidation. In: IEEE Transactions on Electron Devices, 22 (8). pp. 566-568.

Publicador

IEEE

Relação

http://ieeexplore.ieee.org/search/wrapper.jsp?arnumber=1478013&sourceID=ISI

http://eprints.iisc.ernet.in/24036/

Palavras-Chave #Electrical Engineering
Tipo

Journal Article

PeerReviewed