Approximate solution for the redistribution of impurities during second oxidation
Data(s) |
01/08/1975
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Resumo |
The impurity profile for the second oxidation, used in MOST fabrication, has been obtained by Margalit et al. [1]. The disadvantage of this technique is that the accuracy of their solution is directly dependent on the computer time. In this article, an analytical solution is presented using the approximation of linearizing the second oxidation procedure. |
Formato |
application/pdf |
Identificador |
http://eprints.iisc.ernet.in/24036/1/getPDF.pdf Chakrabarti, Utpal K (1975) Approximate solution for the redistribution of impurities during second oxidation. In: IEEE Transactions on Electron Devices, 22 (8). pp. 566-568. |
Publicador |
IEEE |
Relação |
http://ieeexplore.ieee.org/search/wrapper.jsp?arnumber=1478013&sourceID=ISI http://eprints.iisc.ernet.in/24036/ |
Palavras-Chave | #Electrical Engineering |
Tipo |
Journal Article PeerReviewed |