On uniformity of film thickness on rotating substrates having a large source-to-substrate height
Data(s) |
01/02/1974
|
---|---|
Resumo |
Abstract is not available. |
Formato |
application/pdf |
Identificador |
http://eprints.iisc.ernet.in/23355/1/fulltext.pdf Ramprasad, BS and Radha, TS (1974) On uniformity of film thickness on rotating substrates having a large source-to-substrate height. In: Thin Solid Films, 20 (2). S47-S48. |
Publicador |
Elsevier Science |
Relação |
http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW0-46MD38W-NG&_user=512776&_rdoc=1&_fmt=&_orig=search&_sort=d&_docanchor=&view=c&_acct=C000025298&_version=1&_urlVersion=0&_userid=512776&md5=3c9099cf24e089a9b295037744e70fce http://eprints.iisc.ernet.in/23355/ |
Palavras-Chave | #Instrumentation and Applied Physics (Formally ISU) |
Tipo |
Journal Article PeerReviewed |