On uniformity of film thickness on rotating substrates having a large source-to-substrate height


Autoria(s): Ramprasad, BS; Radha, TS
Data(s)

01/02/1974

Resumo

Abstract is not available.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/23355/1/fulltext.pdf

Ramprasad, BS and Radha, TS (1974) On uniformity of film thickness on rotating substrates having a large source-to-substrate height. In: Thin Solid Films, 20 (2). S47-S48.

Publicador

Elsevier Science

Relação

http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW0-46MD38W-NG&_user=512776&_rdoc=1&_fmt=&_orig=search&_sort=d&_docanchor=&view=c&_acct=C000025298&_version=1&_urlVersion=0&_userid=512776&md5=3c9099cf24e089a9b295037744e70fce

http://eprints.iisc.ernet.in/23355/

Palavras-Chave #Instrumentation and Applied Physics (Formally ISU)
Tipo

Journal Article

PeerReviewed