Optimum geometry for uniform deposits on a rotating substrate from a point source
| Data(s) |
01/04/1974
|
|---|---|
| Resumo |
The application of an algorithm shows that maximum uniformity of film thickness on a rotating substrate is achieved for a normalized source-to-substrate distance ratio, h/r =1.183. |
| Formato |
application/pdf |
| Identificador |
http://eprints.iisc.ernet.in/23317/1/fulltext.pdf Ramprasad, BS and Radha, TS (1974) Optimum geometry for uniform deposits on a rotating substrate from a point source. In: Vacuum, 24 (4). pp. 165-166. |
| Publicador |
Elsevier Science |
| Relação |
http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW4-46TY5JB-2&_user=512776&_rdoc=1&_fmt=&_orig=search&_sort=d&_docanchor=&view=c&_acct=C000025298&_version=1&_urlVersion=0&_userid=512776&md5=e5eac31c326f734c98ea6c7d30f18f42 http://eprints.iisc.ernet.in/23317/ |
| Palavras-Chave | #Instrumentation and Applied Physics (Formally ISU) |
| Tipo |
Journal Article PeerReviewed |
