Properties of the gold related acceptor level in silicon


Autoria(s): Kalyanaraman, V; Kumar, V
Data(s)

1982

Resumo

The apparent thermal activation energy of 0.56 eV and the electron thermal capture cross section of 2.0 × 10-16 cm2 are measured for the gold related acceptor level in p+ nn+ silicon diodes by isothermal current transient and DLTS techniques. Using the emission and capture rate data and a degeneracy ratio of 2, the energy separation of the trap level from the conduction band is calculated and found to have the same temperature dependence as the band gap indicating that the acceptor level is pinned with respect to the valence band a t Ev + 0.637 eV.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/23292/1/fulltext.pdf

Kalyanaraman, V and Kumar, V (1982) Properties of the gold related acceptor level in silicon. In: Physica Status Solidi A, 70 (1). pp. 317-323.

Publicador

John Wiley and Sons.

Relação

http://www3.interscience.wiley.com/journal/112434694/abstract?CRETRY=1&SRETRY=0

http://eprints.iisc.ernet.in/23292/

Palavras-Chave #Physics
Tipo

Journal Article

PeerReviewed