Pressure induced effects in bulk amorphous n-type semiconductors(GeSe3.5)100âxBix


Autoria(s): Bhatia, KL; Parthasarathy, G; Gopal, ESR
Data(s)

01/01/1985

Resumo

The effect of pressure on the electrical resistivity of amorphous n-type (GeSe3.5)100�xBix been studied in a Bridgeman anvil system up to a pressure of 90 kbar down to liquid nitrogen temperature. A continuous amorphous semiconductor to metal-like solid transition in the undoped GeSe3.5 is observed at room temperature. Incorporation of Bi in the GeSe3.5 network is found to significantly disturb the behaviour of the resistivity with pressure. With increasing Bi concentration a much broader variation in resistivity with pressure is observed. The temperature dependence of the resistivity and activation energy at different pressures is also measured and they are found to be composition dependent. Results are discussed in the light of the Phillips Model of ordered clusters in chalcogenide semiconductors.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/22126/1/22.pdf

Bhatia, KL and Parthasarathy, G and Gopal, ESR (1985) Pressure induced effects in bulk amorphous n-type semiconductors(GeSe3.5)100âxBix. In: Journal of Non-Crystalline Solids, 69 (2-3). pp. 189-202.

Publicador

Elsevier Science

Relação

http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TXM-48CXNDW-13C&_user=512776&_rdoc=1&_fmt=&_orig=search&_sort=d&_docanchor=&view=c&_acct=C000025298&_version=1&_urlVersion=0&_userid=512776&md5=35665e82e3aa5db2186affa02d2a5570

http://eprints.iisc.ernet.in/22126/

Palavras-Chave #Physics
Tipo

Journal Article

PeerReviewed