Indium clusters on the Ge (5× 5) wetting layer of Si (111)- 7× 7


Autoria(s): MacLeod, J.M.; Psiachos, D.; Stott, M.J.; McLean, A.B.
Data(s)

2006

Resumo

The adsorption of In on the Si(111)−Ge(5×5) surface reconstruction has been studied with scanning tunneling microscopy and ab initio calculations to investigate the possibility of using this reconstruction as a template for cluster formation. As with In adsorption on Si(111)−7×7 at low substrate temperatures and low In fluences, the In adatoms are found to preferentially adsorb on the faulted half-unit cell. However, in contrast to In adsorption on Si(111)−7×7, the In adatoms are also frequently found in the unfaulted half-unit cell at low coverages. The filling of unfaulted unit cell halves is primarily due to the formation of large clusters that span multiple substrate half-unit cells. Moreover, many of the faulted half-unit cells have a streaked appearance that indicates that surface atoms within them are mobile.

Identificador

http://eprints.qut.edu.au/89967/

Publicador

American Physical Society

Relação

http://journals.aps.org/prb/abstract/10.1103/PhysRevB.73.241306

DOI:10.1103/PhysRevB.73.241306

MacLeod, J.M., Psiachos, D., Stott, M.J., & McLean, A.B. (2006) Indium clusters on the Ge (5× 5) wetting layer of Si (111)- 7× 7. Physical Review B, 73(24), p. 241306.

Fonte

School of Chemistry, Physics & Mechanical Engineering; Science & Engineering Faculty

Tipo

Journal Article