Self-assembly of a halogenated molecule on oxide-passivated Cu(110)


Autoria(s): El Garah, Mohamed; Lipton-Duffin, Josh; MacLeod, Jennifer M.; Gutzler, Rico; Palmino, Frank; Luzet, Vincent; Chérioux, Frédéric; Rosei, Federico
Data(s)

01/08/2013

Resumo

The supramolecular self-assembly of brominated molecules was investigated and compared on Cu(110) and Cu(110)[BOND]O(2×1) surfaces under ultrahigh vacuum. By using scanning tunnelling microscopy, we show that brominated molecules form a disordered structure on Cu(110), whereas a well-ordered supramolecular network is observed on the Cu(110)[BOND]O(2×1) surface. The different adsorption behaviors of these two surfaces are described in terms of weakened molecule–substrate interactions on Cu(110)[BOND]O(2×1) as opposed to bare Cu(110). The effect of oxygen-passivation is to suppress debromination and it can be a convenient approach for investigating other self-assembly processes on copper-based substrates.

Identificador

http://eprints.qut.edu.au/89964/

Publicador

John Wiley & Sons, Inc

Relação

DOI:10.1002/asia.201300283

El Garah, Mohamed, Lipton-Duffin, Josh, MacLeod, Jennifer M., Gutzler, Rico, Palmino, Frank, Luzet, Vincent, Chérioux, Frédéric, & Rosei, Federico (2013) Self-assembly of a halogenated molecule on oxide-passivated Cu(110). Chemistry - An Asian Journal, 8(8), pp. 1813-1817.

Direitos

Copyright 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

Fonte

School of Chemistry, Physics & Mechanical Engineering; Institute for Future Environments; Science & Engineering Faculty

Palavras-Chave #copper; dehalogenation; scanning tunneling microscopy; self-assembly; template synthesis
Tipo

Journal Article