Plasma-enhanced chemical vapor deposition of graphene nanostructures


Autoria(s): van der Laan, Timothy; Kumar, Shailesh; Ostrikov, Kostya
Contribuinte(s)

Zhang, Q.

Milne, W.I.

Zou, J.

Data(s)

2012

Resumo

Graphene has received great interest from researchers all over the world owing to its unique properties. Much of the excitement surrounding graphene is due to its remarkable properties and inherent quantum effects. These effects and properties make it a desirable material for the fabrication of new devices. Graphene has a plethora of potential uses including gas and molecular sensors, electronics, spintronics and optics [1-7]. Interestingly, some of these properties have been known about since before the material was even isolated due to a considerable amount of theoretical work and simulations. The material was to some extent a condensed matter modelers "toy" as it was used as a benchmark 2D material Graphene had been used for a long time as the fundamental building block of many other carbon structures...

Identificador

http://eprints.qut.edu.au/74663/

Publicador

CRC Press

Relação

DOI:10.1201/b14791-4

van der Laan, Timothy, Kumar, Shailesh, & Ostrikov, Kostya (2012) Plasma-enhanced chemical vapor deposition of graphene nanostructures. In Zhang, Q., Milne, W.I., & Zou, J. (Eds.) Advances in Nanodevices and Nanofabrication. CRC Press, Boca Raton, FL, pp. 75-98.

Direitos

Copyright 2012 Taylor & Francis Group, LLC

Fonte

School of Chemistry, Physics & Mechanical Engineering; Science & Engineering Faculty

Tipo

Book Chapter