Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions
Data(s) |
2001
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Resumo |
Charging and trapping of macroparticles in the near-electrode region of fluorocarbon etching plasmas with negative ions is considered. The equilibrium charge and forces on particles are computed as a function of the local position in the plasma presheath and sheath. The ionic composition of the plasma corresponds to the etching experiments in 2.45 GHz surface-wave sustained and 13.56 MHz inductively coupled C4F8+Ar plasmas. It is shown that despite negligible negative ion currents collected by the particles, the negative fluorine ions affect the charging and trapping of particulates through modification of the sheath/presheath structure. |
Formato |
application/pdf |
Identificador | |
Publicador |
American Institute of Physics |
Relação |
http://eprints.qut.edu.au/74170/1/74170.pdf DOI:10.1063/1.1375149 Ostrikov, K., Kumar, S., & Sugai, H. (2001) Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions. Physics of Plasmas, 8(7), pp. 3490-3497. |
Direitos |
Copyright 2001 American Institute of Physics |
Fonte |
Science & Engineering Faculty |
Palavras-Chave | #Plasma materials processing #Ion trapping #Inductively coupled plasma |
Tipo |
Journal Article |