Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions


Autoria(s): Ostrikov, K.; Kumar, S.; Sugai, H.
Data(s)

2001

Resumo

Charging and trapping of macroparticles in the near-electrode region of fluorocarbon etching plasmas with negative ions is considered. The equilibrium charge and forces on particles are computed as a function of the local position in the plasma presheath and sheath. The ionic composition of the plasma corresponds to the etching experiments in 2.45 GHz surface-wave sustained and 13.56 MHz inductively coupled C4F8+Ar plasmas. It is shown that despite negligible negative ion currents collected by the particles, the negative fluorine ions affect the charging and trapping of particulates through modification of the sheath/presheath structure.

Formato

application/pdf

Identificador

http://eprints.qut.edu.au/74170/

Publicador

American Institute of Physics

Relação

http://eprints.qut.edu.au/74170/1/74170.pdf

DOI:10.1063/1.1375149

Ostrikov, K., Kumar, S., & Sugai, H. (2001) Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions. Physics of Plasmas, 8(7), pp. 3490-3497.

Direitos

Copyright 2001 American Institute of Physics

Fonte

Science & Engineering Faculty

Palavras-Chave #Plasma materials processing #Ion trapping #Inductively coupled plasma
Tipo

Journal Article