Nanopowder management and control of plasma parameters in electronegative SiH4 plasmas
| Data(s) |
01/11/2003
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|---|---|
| Resumo |
The nanopowder management and control of plasma parameters in electronegative SiH4 plasmas were discussed. The spatial profiles of electron and positive/negative ion number densities, electron temperature and charge of the fine particles were obtained. It was found that management of powder charge distribution is also possible through control of the external parameters. |
| Formato |
application/pdf |
| Identificador | |
| Publicador |
American Institute of Physics |
| Relação |
http://eprints.qut.edu.au/73870/1/73870.pdf DOI:10.1063/1.1618356 Denysenko, I. B., Ostrikov, K., Xu, S., Yu, M. Y., & Diong, C. H. (2003) Nanopowder management and control of plasma parameters in electronegative SiH4 plasmas. Journal of Applied Physics, 94(9), pp. 6097-6107. |
| Direitos |
Copyright 2003 American Institute of Physics |
| Fonte |
School of Chemistry, Physics & Mechanical Engineering; Science & Engineering Faculty |
| Palavras-Chave | #nanopowders #numerical modeling #photon density #plasma temperature #nanoparticles |
| Tipo |
Journal Article |
