Carbon nanofiber growth in plasma-enhanced chemical vapor deposition


Autoria(s): Denysenko, I.; Ostrikov, K.; Cvelbar, U.; Mozetic, M.; Azarenkov, N.A.
Data(s)

2008

Resumo

A theoretical model to describe the plasma-assisted growth of carbon nanofibers (CNFs) is proposed. Using the model, the plasma-related effects on the nanofiber growth parameters, such as the growth rate due to surface and bulk diffusion, the effective carbon flux to the catalyst surface, the characteristic residence time and diffusion length of carbon atoms on the catalyst surface, and the surface coverages, have been studied. The dependence of these parameters on the catalyst surface temperature and ion and etching gas fluxes to the catalyst surface is quantified. The optimum conditions under which a low-temperature plasma environment can benefit the CNF growth are formulated. These results are in good agreement with the available experimental data on CNF growth and can be used for optimizing synthesis of related nanoassemblies in low-temperature plasma-assisted nanofabrication. © 2008 American Institute of Physics.

Formato

application/pdf

Identificador

http://eprints.qut.edu.au/73868/

Publicador

American Institute of Physics

Relação

http://eprints.qut.edu.au/73868/1/73868%28pub%29.pdf

DOI:10.1063/1.2986915

Denysenko, I., Ostrikov, K., Cvelbar, U., Mozetic, M., & Azarenkov, N.A. (2008) Carbon nanofiber growth in plasma-enhanced chemical vapor deposition. Journal of Applied Physics, 104(7), 073301-1.

Direitos

Copyright 2008 American Institute of Physics

Fonte

Science & Engineering Faculty

Tipo

Journal Article