Current control in the magnetron systems for nanofabrication : a comparison
Data(s) |
01/04/2012
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Resumo |
A cylindrical magnetron system and a hybrid inductively coupled plasma-assisted magnetron deposition system were examined experimentally in light of their discharge characteristics with a view to stress the enhanced controllability of the hybrid system. The comparative study has shown that the hybrid magnetron + the inductively coupled plasma system is a flexible, powerful, and convenient tool that has certain advantages as compared with the cylindrical dc magnetrons. In particular, the hybrid system features more linear current-voltage characteristics and the possibility of a bias-independent control of the discharge current. |
Identificador | |
Publicador |
Institute of Electrical and Electronics Engineers |
Relação |
DOI:10.1109/TPS.2012.2185716 Yick, S., Levchenko, I., Kumar, S., Han, Z. J., Yajadda, M. M. A., & Ostrikov, K. (2012) Current control in the magnetron systems for nanofabrication : a comparison. IEEE Transactions on Plasma Science, 40(4), pp. 1094-1097. |
Fonte |
School of Chemistry, Physics & Mechanical Engineering; Science & Engineering Faculty |
Palavras-Chave | #Cylindrical dc magnetron #deposition #low-frequency inductively coupled (ICP) plasma #magnetron |
Tipo |
Journal Article |