Current control in the magnetron systems for nanofabrication : a comparison


Autoria(s): Yick, S.; Levchenko, I.; Kumar, S.; Han, Z. J.; Yajadda, M. M. A.; Ostrikov, K.
Data(s)

01/04/2012

Resumo

A cylindrical magnetron system and a hybrid inductively coupled plasma-assisted magnetron deposition system were examined experimentally in light of their discharge characteristics with a view to stress the enhanced controllability of the hybrid system. The comparative study has shown that the hybrid magnetron + the inductively coupled plasma system is a flexible, powerful, and convenient tool that has certain advantages as compared with the cylindrical dc magnetrons. In particular, the hybrid system features more linear current-voltage characteristics and the possibility of a bias-independent control of the discharge current.

Identificador

http://eprints.qut.edu.au/73571/

Publicador

Institute of Electrical and Electronics Engineers

Relação

DOI:10.1109/TPS.2012.2185716

Yick, S., Levchenko, I., Kumar, S., Han, Z. J., Yajadda, M. M. A., & Ostrikov, K. (2012) Current control in the magnetron systems for nanofabrication : a comparison. IEEE Transactions on Plasma Science, 40(4), pp. 1094-1097.

Fonte

School of Chemistry, Physics & Mechanical Engineering; Science & Engineering Faculty

Palavras-Chave #Cylindrical dc magnetron #deposition #low-frequency inductively coupled (ICP) plasma #magnetron
Tipo

Journal Article