Hydrogen gas sensing properties of Pt/Ta2O5 Schottky diodes based on Si and SiC substrates


Autoria(s): Yu, J.; Chen, G.; Li, C.X.; Shafiei, M.; Ou, J.; du Plessis, J.; Kalantar-zadeh, K.; Lai, P.T.; Wlodarski, W.
Data(s)

2010

Resumo

In this paper, we fabricated Pt/tantalum oxide (Ta2O5) Schottky diodes for hydrogen sensing applications. Thin (4 nm) layer of Ta2O5 was deposited on silicon (Si) and silicon carbide (SiC) substrates by radio frequency (RF) sputtering technique. We compared the performance of these sensors at different elevated temperatures of 100 ∘C and 150 ∘C. At these temperatures, the sensor based on SiC exhibited a larger sensitivity while the sensor based on Si exhibited a faster response toward hydrogen gas. We discussed herein, the responses exhibited by the Pt/Ta2O5 based Schottky diodes demonstrated a promising potential for hydrogen sensing applications.

Identificador

http://eprints.qut.edu.au/47547/

Publicador

Elsevier BV

Relação

DOI:10.1016/j.proeng.2010.09.069

Yu, J., Chen, G., Li, C.X., Shafiei, M., Ou, J., du Plessis, J., Kalantar-zadeh, K., Lai, P.T., & Wlodarski, W. (2010) Hydrogen gas sensing properties of Pt/Ta2O5 Schottky diodes based on Si and SiC substrates. Procedia Engineering, 5, pp. 147-151.

Fonte

Faculty of Built Environment and Engineering

Palavras-Chave #Tantalum oxide #RF sputtering #Schottky diode #Gas sensor #Hydrogen
Tipo

Journal Article