Hydrogen gas sensing properties of Pt/Ta2O5 Schottky diodes based on Si and SiC substrates
Data(s) |
2010
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Resumo |
In this paper, we fabricated Pt/tantalum oxide (Ta2O5) Schottky diodes for hydrogen sensing applications. Thin (4 nm) layer of Ta2O5 was deposited on silicon (Si) and silicon carbide (SiC) substrates by radio frequency (RF) sputtering technique. We compared the performance of these sensors at different elevated temperatures of 100 ∘C and 150 ∘C. At these temperatures, the sensor based on SiC exhibited a larger sensitivity while the sensor based on Si exhibited a faster response toward hydrogen gas. We discussed herein, the responses exhibited by the Pt/Ta2O5 based Schottky diodes demonstrated a promising potential for hydrogen sensing applications. |
Identificador | |
Publicador |
Elsevier BV |
Relação |
DOI:10.1016/j.proeng.2010.09.069 Yu, J., Chen, G., Li, C.X., Shafiei, M., Ou, J., du Plessis, J., Kalantar-zadeh, K., Lai, P.T., & Wlodarski, W. (2010) Hydrogen gas sensing properties of Pt/Ta2O5 Schottky diodes based on Si and SiC substrates. Procedia Engineering, 5, pp. 147-151. |
Fonte |
Faculty of Built Environment and Engineering |
Palavras-Chave | #Tantalum oxide #RF sputtering #Schottky diode #Gas sensor #Hydrogen |
Tipo |
Journal Article |