Application of quantitative structure property relationship to the design of high refractive index 193i resist

Autoria(s): Blakey, Idriss; Conley, Willard; George, Graeme; Hill, David; Liu, Heping; Whittaker, Andrew
Data(s)

2008
Identificador

http://eprints.qut.edu.au/30900/
Publicador

SPIE - International Society for Optical Engineering
Relação

DOI:10.1117/1.2908937

Blakey, Idriss, Conley, Willard, George, Graeme, Hill, David, Liu, Heping, & Whittaker, Andrew (2008) Application of quantitative structure property relationship to the design of high refractive index 193i resist. Journal of Micro/Nanolithography, MEMS, and MOEMS, 7(2), 023001-1-023001-11.
Fonte

Faculty of Science and Technology
Palavras-Chave #030303 Optical Properties of Materials #030304 Physical Chemistry of Materials #030307 Theory and Design of Materials #quantitative structure property relationship (QSPR), photolithography, photoresist
Tipo

Journal Article
Acesso ao item digital