Fluorinated-plasma modification of polyetherimide films


Autoria(s): Kaba, M.; Essamri, A.; Mas, A.; Schue, F.; George, G. A.; Cardona, F.; Rintoul, L.; Wood, B. J.
Data(s)

01/01/2006

Resumo

Ultem 1000 polyetherimide films prepared by cast-evaporating technique were covered with a 1H,1H,2H-tridecafluoro-oct-1-ene (PFO) plasma-polymerized layer. The effects of the plasma exposure time on the surface composition were studied by X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, and surface energy analysis. The surface topography of the plasma layer was deduced from scanning electron microscopy. The F/C ratio for plasma-polymerized PFO under the input RF power of 50 W can be as high as 1.30 for 480 s and similar to 0.4-2 at % of oxygen was detected, resulting from the reaction of long-lived radicals in the plasma polymer with atmospheric oxygen. The plasma deposition of fluorocarbon coating from plasma PFO reduces the surface energy from 46 to 18.3 mJ m(-2). (c) 2006 Wiley Periodicals, Inc.

Identificador

http://espace.library.uq.edu.au/view/UQ:80101

Idioma(s)

eng

Publicador

John Wiley & Sons

Palavras-Chave #Plasma Polymerization #Fluoropolymer #X-ray Photoelectron Spectroscopy #Polyimide #Polymer Science #Low Dielectric-constant #Surface Fluorination #Polymerized Octofluorocyclobutane #Solid-surfaces #Membranes #Energy #Hexafluoropropylene #Spectroscopy #Gas #C1 #250502 Physical Chemistry of Macromolecules #780103 Chemical sciences #03 Chemical Sciences #0303 Macromolecular and Materials Chemistry #09 Engineering #0912 Materials Engineering
Tipo

Journal Article