Atmospheric pressure chemical vapour deposition of boron doped titanium dioxide for photocatalytic water reduction and oxidation
Data(s) |
2013
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Resumo |
Boron-doped titanium dioxide (B-TiO) films were deposited by atmospheric pressure chemical vapour deposition of titanium(iv) chloride, ethyl acetate and tri-isopropyl borate on steel and fluorine-doped-tin oxide substrates at 500, 550 and 600 °C, respectively. The films were characterised using powder X-ray diffraction (PXRD), which showed anatase phase TiO at lower deposition temperatures (500 and 550 °C) and rutile at higher deposition temperatures (600 °C). X-ray photoelectron spectroscopy (XPS) showed a dopant level of 0.9 at% B in an O-substitutional position. The ability of the films to reduce water was tested in a sacrificial system using 365 nm UV light with an irradiance of 2 mW cm. Hydrogen production rates of B-TiO at 24 μL cm h far exceeded undoped TiO at 2.6 μL cm h. The B-TiO samples were also shown to be active for water oxidation in a sacrificial solution. Photocurrent density tests also revealed that B-doped samples performed better, with an earlier onset of photocurrent. © 2013 The Owner Societies. |
Formato |
application/pdf |
Identificador |
http://dx.doi.org/10.1039/c3cp52665h http://pure.qub.ac.uk/ws/files/11106503/Atmospheric_pressure_chemical_vapour_deposition_of.pdf http://www.scopus.com/inward/record.url?eid=2-s2.0-84884300063&partnerID=8YFLogxK |
Idioma(s) |
eng |
Direitos |
info:eu-repo/semantics/openAccess |
Fonte |
Carmichael , P , Hazafy , D , Bhachu , D S , Mills , A , Darr , J A & Parkin , I P 2013 , ' Atmospheric pressure chemical vapour deposition of boron doped titanium dioxide for photocatalytic water reduction and oxidation ' Physical Chemistry Chemical Physics , vol 15 , pp. 16788-16794, Impact Factor: 4.5 . DOI: 10.1039/c3cp52665h |
Tipo |
article |