Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition


Autoria(s): Ray, S.K.; McNeill, David; Gay, D.L.; Maiti, C.K.; Armstrong, Alastair; Armstrong, Mervyn; Gamble, Harold
Data(s)

01/02/1997

Identificador

http://pure.qub.ac.uk/portal/en/publications/comparison-of-si1ycy-films-produced-by-solidphase-epitaxy-and-rapid-thermal-chemical-vapour-deposition(cd573a13-c376-4f11-b5fb-1f05e535a7d7).html

Idioma(s)

eng

Direitos

info:eu-repo/semantics/restrictedAccess

Fonte

Ray , S K , McNeill , D , Gay , D L , Maiti , C K , Armstrong , A , Armstrong , M & Gamble , H 1997 , ' Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition ' Thin Solid Films , vol 294(1-2) , pp. 149-152 .

Tipo

article