Bonding quartz wafers by the atom transfer radical polymerization of the glycidyl methacrylate at mild temperature


Autoria(s): Zhao JY; Shang ZP; Gao LX
Data(s)

2007

Resumo

In this paper, we presented a novel covalent bonding process between two quartz wafers at 300 degrees C. High-quality wafer bonding was formed by the hydroxylization, aminosilylation and atom transfer radical polymerization (ATRP) of glycidyl methacrylate (GMA), respectively, on quartz wafer surfaces, followed by close contact of the GMA functional wafer and the aminosilylation wafer, the epoxy group opening ring reaction was catalyzed by the amino and solidified to form the covalent bonding of the quartz wafers. The shear force between two wafers in all bonding samples was higher than 1.5 MPa. Microfluidic chips bonded by the above procedures had high transparency and the present procedure avoided the adhesive to block or flow into the channel.

Identificador

http://ir.ciac.jl.cn/handle/322003/14399

http://www.irgrid.ac.cn/handle/1471x/150158

Idioma(s)

英语

Fonte

Zhao JY;Shang ZP;Gao LX.Bonding quartz wafers by the atom transfer radical polymerization of the glycidyl methacrylate at mild temperature,SENSORS AND ACTUATORS A-PHYSICAL,2007 ,135(1):257-261

Palavras-Chave #SILICON-ON-INSULATOR #CAPILLARY-ELECTROPHORESIS #ROOM-TEMPERATURE #ANALYSIS SYSTEMS #SURFACE-DENSITY #THIN-LAYERS #AMINE GROUP #GLASS #DEVICES #TECHNOLOGY
Tipo

期刊论文