Improvement in performance and microstructure of doped graphites as plasma-facing materials by a new process

Autoria(s): Liu ZJ(刘占军); Guo QG(郭全贵); Liu L(刘朗); Chen JL(陈俊岭); Li JG(李建刚)
Data(s)

2007
Identificador

http://ir.sxicc.ac.cn/handle/0/3861

http://www.irgrid.ac.cn/handle/1471x/150089
Idioma(s)

英语
Fonte

刘占军,郭全贵,刘朗,陈俊岭,李建刚.Improvement in performance and microstructure of doped graphites as plasma-facing materials by a new process.Fusion Engineering and Design,2007,82(1):55-59
Tipo

期刊论文
Acesso ao item digital