Diffractive microlens with a cascade focal plane fabricated by single mask UV-photolithography and common KOH:H2O etching


Autoria(s): Zhang XY (Zhang Xinyu); Li H (Li Hui); Liu K (Liu Kan); Luo J (Luo Jun); Xie CS (Xie Changsheng); Ji A (Ji An); Zhang TX (Zhang Tianxu)
Data(s)

2010

Resumo

A diffractive microlens with a cascade focal plane along the main optical axis of the device is fabricated using a low-cost technique mainly including single mask ultraviolet (UV) photolithography and dual-step KOH:H2O etching. Based on the evolutionary behavior of converse pyramid-shaped microholes (CPSMs) preshaped over a {100}-oriented silicon wafer in KOH etchant, the first-step KOH etching is performed to transfer initial square micro-openings in a SiO2 film grown by plasma enhanced chemical vapor deposition (PECVD) and patterned by single mask UV-photolithography, into CPSMs with needed dimension. After completely removing a thinned SiO2 mask, basic annular phase steps with a relatively steep sidewall and scheduled height can be shaped in the overlapped etching region between the neighboring silicon concave-arc microstructures evolved from CPSMs through the second-step KOH etching. Morphological measurements demonstrate a desirable surface of the silicon microlens with a roughness in nanometer scale and the feature height of the phase steps formed in the submicrometer range. Conventional optics measurements of the plastic diffractive microlens obtained by further hot embossing the fine microrelief phase map over the nickel mask made through a common electrochemical method indicate a highly efficient cascaded focusing performance.

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Made available in DSpace on 2010-11-02T02:02:04Z (GMT). No. of bitstreams: 1 Diffractive microlens with a cascade focal plane fabricated by single mask UV-photolithography and common KOH:H2O etching.pdf: 930851 bytes, checksum: 0d36d5eeb6c729fa6033104f7503f659 (MD5) Previous issue date: 2010

The authors are grateful to the Analytical and Testing Center of Huazhong University of Science&Technology for valuable help. This research was supported by the Key Fund of Wuhan National Laboratory for Optoelectronics (no 0101187006) and the National Natural Science Foundation of China (no 60777003 and no 60736010).

其它

The authors are grateful to the Analytical and Testing Center of Huazhong University of Science&Technology for valuable help. This research was supported by the Key Fund of Wuhan National Laboratory for Optoelectronics (no 0101187006) and the National Natural Science Foundation of China (no 60777003 and no 60736010).

Identificador

http://ir.semi.ac.cn/handle/172111/13905

http://www.irgrid.ac.cn/handle/1471x/105271

Idioma(s)

英语

Fonte

Zhang XY (Zhang Xinyu), Li H (Li Hui), Liu K (Liu Kan), Luo J (Luo Jun), Xie CS (Xie Changsheng), Ji A (Ji An), Zhang TX (Zhang Tianxu).Diffractive microlens with a cascade focal plane fabricated by single mask UV-photolithography and common KOH:H2O etching.JOURNAL OF MICROMECHANICS AND MICROENGINEERING,2010,20(10):Art. No. 105029

Palavras-Chave #微电子学 #OPTICAL-ELEMENTS #DESIGN #SILICON #ARRAYS #LENSES
Tipo

期刊论文