Sidegating effect on Schottky contact in ion-implanted GaAs


Autoria(s): Wu J; Wang ZG; Fan TW; Lin LY; Zhang M
Data(s)

1995

Resumo

The sidegating effect on the Schottky barrier in ion-implanted GaAs was investigated with capacitance-voltage profiling at various negative substrate voltages. It was demonstrated that the negative substrate voltage modulates the Schottky depletion region width as well as the space charge region at the substrate-active channel interface. (C) 1995 American Institute of Physics.

The sidegating effect on the Schottky barrier in ion-implanted GaAs was investigated with capacitance-voltage profiling at various negative substrate voltages. It was demonstrated that the negative substrate voltage modulates the Schottky depletion region width as well as the space charge region at the substrate-active channel interface. (C) 1995 American Institute of Physics.

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MMEI,13TH RES INST,SHIJIAZHUANG 050051,PEOPLES R CHINA

Identificador

http://ir.semi.ac.cn/handle/172111/15475

http://www.irgrid.ac.cn/handle/1471x/101776

Idioma(s)

英语

Fonte

Wu J; Wang ZG; Fan TW; Lin LY; Zhang M .Sidegating effect on Schottky contact in ion-implanted GaAs ,JOURNAL OF APPLIED PHYSICS,1995,78(12):7422-7423

Palavras-Chave #半导体材料
Tipo

期刊论文