Structural and magnetic properties of GaN:Sm:Eu films fabricated by co-implantation method


Autoria(s): Sun LL (Sun Lili); Liu C (Liu Chao); Li JM (Li Jianming); Wang JX (Wang Junxi); Yan FW (Yan Fawang); Zeng YP (Zeng Yiping); Li JM (Li Jinmin)
Data(s)

2010

Resumo

Diluted-magnetic GaN:Sm:Eu films have been fabricated by co-implantation of Sm and Eu ions into c-plane (0001) GaN films and a subsequent annealing process. The structural, morphological and magnetic characteristics of the samples have been investigated by means of high-resolution X-ray diffraction (HRXRD), atomic force microscopy (AFM), and superconducting quantum interference device (SQUID). The XRD and AFM analyses show that the annealing process can effectively recover the crystalline degradation caused by implantation. Compared with GaN:Sm films, more defects have been introduced into GaN:Sm:Eu films due to the Eu implantation process. According to the SQUID analysis, GaN:Sm:Eu films exhibit clear room-temperature ferromagnetism. Moreover, GaN:Sm:Eu films show a lower saturation magnetization (Ms) than GaN:Sm films.

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Natural Science Foundation of China 60876004

其它

Natural Science Foundation of China 60876004

Identificador

http://ir.semi.ac.cn/handle/172111/11227

http://www.irgrid.ac.cn/handle/1471x/66115

Idioma(s)

英语

Fonte

Sun LL (Sun Lili), Liu C (Liu Chao), Li JM (Li Jianming), Wang JX (Wang Junxi), Yan FW (Yan Fawang), Zeng YP (Zeng Yiping), Li JM (Li Jinmin).Structural and magnetic properties of GaN:Sm:Eu films fabricated by co-implantation method. MATERIALS LETTERS,2010,64(9):1031-1033

Palavras-Chave #半导体材料 #Magnetic materials #Semiconductors #Ion implantation
Tipo

期刊论文