Study on Mg memory effect in npn type AlGaN/GaN HBT structures grown by MOCVD


Autoria(s): Ran JX; Wang XL; Hu GX; Wang JX; Li JP; Wang CM; Zeng YP; Li JM
Data(s)

2006

Resumo

AlGaN/GaN npn heterojunction bipolar transistor structures were grown by low-pressure MOCVD. Secondary ion mass spectroscopy (SIMS) measurements were carried out to study the Mg memory effect and redistribution in the emitter-base junction. The results indicated that there is a Mg-rich film formed in the ongrowing layer after the Cp2Mg source is switched off. The Mg-rich film can be confined in the base section by switching off the Cp2Mg source for appropriate time before the end of base growth. Low temperature growth of the undoped GaN spacer suppresses the Mg redistribution from Mg rich film. The delay rate of the Mg profile in sample C with spacer growing in low temperature is about 56 nm/decade, which becomes sharper than 80 nm/decade of the samples A and B without low temperature spacer. (C) 2005 Elsevier Ltd. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/10618

http://www.irgrid.ac.cn/handle/1471x/64505

Idioma(s)

英语

Fonte

Ran JX; Wang XL; Hu GX; Wang JX; Li JP; Wang CM; Zeng YP; Li JM .Study on Mg memory effect in npn type AlGaN/GaN HBT structures grown by MOCVD ,MICROELECTRONICS JOURNAL,2006,37(7):583-585

Palavras-Chave #半导体材料 #GaN #Mg memory effect #redistribution #AlGaN/GaN HBTs #MOCVD #CHEMICAL-VAPOR-DEPOSITION #HETEROJUNCTION BIPOLAR-TRANSISTORS #FABRICATION
Tipo

期刊论文