Enhanced near-infrared photoluminescence from isoelectronic luminescent centers in sulfur-implanted silicon with copper or silver coimplantation


Autoria(s): Zhang JG; Wang XX; Cheng BW; Yu JZ; Wang QM; Hau J; Ding L; Ge WK
Data(s)

2007

Resumo

Enhanced near-infrared photoluminescence (PL) from sulfur-related isoelectronic luminescent centers in silicon was observed from thermally quenched sulfur-implanted silicon in which additional copper or silver ions had been coimplanted. The PL from the sulfur and copper coimplanted silicon peaked between 70 and 100 K and persisted to 260 K. This result strongly supports the original conjecture from the optical detection of magnetic resonance studies that the strong PL from sulfur-doped silicon comes from S-Cu isoelectronic complexes [Frens , Phys. Rev. B 46, 12316 (1992); Mason , ibid. 58, 7007 (1998).]. (c) 2007 American Institute of Physics.

Identificador

http://ir.semi.ac.cn/handle/172111/9628

http://www.irgrid.ac.cn/handle/1471x/64226

Idioma(s)

英语

Fonte

Zhang, JG (Zhang, J. G.); Wang, XX (Wang, X. X.); Cheng, BW (Cheng, B. W.); Yu, JZ (Yu, J. Z.); Wang, QM (Wang, Q. M.); Hau, J (Hau, J.); Ding, L (Ding, L.); Ge, WK (Ge, W. K.) .Enhanced near-infrared photoluminescence from isoelectronic luminescent centers in sulfur-implanted silicon with copper or silver coimplantation ,APPLIED PHYSICS LETTERS,FEB 19 2007,90 (8):Art.No.081101

Palavras-Chave #半导体物理 #DOPED CRYSTALLINE SILICON
Tipo

期刊论文