Fabrication of photonic crystals on several kinds of semiconductor materials by using focused-ion beam method


Autoria(s): Xu XS (Xu Xingsheng); Chen HD (Chen Hongda); Xiong ZG (Xiong Zhigang); Jin AZ (Jin Aizi); Gu CZ (Gu Changzhi); Cheng BY (Cheng Bingying); Zhang DZ (Zhang Daozhong)
Data(s)

2007

Resumo

In this paper, we introduced the fabrication of photonic crystals on several kinds of semiconductor materials by using focused-ion beam machine, it shows that the method of focused-ion beam can fabricate two-dimensional photonic crystal and photonic crystal device efficiently, and the quality of the fabricated photonic crystal is high. Using the focused-ion beam method, we fabricate photonic crystal wavelength division multiplexer, and its characteristics are analyzed. (c) 2007 Elsevier B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/9252

http://www.irgrid.ac.cn/handle/1471x/64038

Idioma(s)

英语

Fonte

Xu, XS (Xu, Xingsheng); Chen, HD (Chen, Hongda); Xiong, ZG (Xiong, Zhigang); Jin, AZ (Jin, Aizi); Gu, CZ (Gu, Changzhi); Cheng, BY (Cheng, Bingying); Zhang, DZ (Zhang, Daozhong) .Fabrication of photonic crystals on several kinds of semiconductor materials by using focused-ion beam method ,THIN SOLID FILMS,AUG 15 2007,515 (22):8297-8300

Palavras-Chave #光电子学 #photonic crystal
Tipo

期刊论文