Influence of Mg content on molecular-beam-epitaxy-grown ZnMgS ultraviolet photodetectors


Autoria(s): Lu, LW; Sou, IK; Ge, WK
Data(s)

2004

Resumo

Zn1-xMgxS-based Schottky barrier ultraviolet (UV) photodetectors were fabricated using the molecular-beam-epitaxy (MBE) technique. The influence of Mg content on MBE-grown Zn1-xMgxS-based UV photodetectors has been investigated in details with a variety of experimental techniques, including photoresponse (PR), capacitance-voltage, deep level transient Fourier spectroscopy (DLTFS) and photoluminescence (PL). The room-temperature PR results show that the abrupt long-wavelength cutoffs covering 325, 305 295. and 270 nm with Mg contents of 16%, 44%, 57%, and 75% in the Zn1-xMgxS active layers, respectively, were achieved. But the responsivity and the external quantum efficiency exhibited a slight decrease with the Mg content increasing. In good agreement with the PR results, both of the integrated intensity of the PL spectra obtained from Zn1-xMgxS thin films with different Mg compositions (x = 31% and 52%, respectively) and the DLTFS spectra obtained from Zn1-xMgxS-based (x = 5% and 45%, respectively) UV photodetector samples clearly revealed a significant concentration increase of the non-radiative deep traps with increasing Mg containing in the ZnMgS active layers. Our experimental results also indicate that the MBE-grown ZnMgS-based photodetectors can offer the promising characteristics for the detection of short-wavelength UV radiation. (C) 2004 Elsevier B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/8106

http://www.irgrid.ac.cn/handle/1471x/63647

Idioma(s)

英语

Fonte

Lu, LW; Sou, IK; Ge, WK .Influence of Mg content on molecular-beam-epitaxy-grown ZnMgS ultraviolet photodetectors ,JOURNAL OF CRYSTAL GROWTH,APR 15 2004,265 (1-2):28-33

Palavras-Chave #半导体材料 #characterization
Tipo

期刊论文