Realization of MMI power splitter by UV-light imprinting technique using hybrid sol-gel SiO2 materials


Autoria(s): Wang, Y; Wu, YD; Li, JG; Wang, HJ; Hu, XW
Data(s)

2008

Resumo

An efficient fabrication scheme of buried ridge waveguide devices is demonstrated by UV-light imprinting technique using organic-in organic hybrid sol-gel Zr-doped SiO2 materials. The refractive indices of a guiding layer and a cladding layer for the buried ridge waveguide structure are 1.537 and 1.492 measured at 1550 nm, respectively. The tested results show more circular mode profiles clue to existence of the cladding layer. A buried ridge single-mode waveguide operating at 1550 nm has a low propagation loss (0.088 dB/cm) and the 1 x 2 MMI power splitter exhibits uniform outputs, with a very low splitting loss of 0.029 dB at 1549 nm.

National Natural Science Foundation of China 60507006 60707008Supported by the National Natural Science Foundation of China under Grant Nos 60507006 and 60707008.

Identificador

http://ir.semi.ac.cn/handle/172111/6430

http://www.irgrid.ac.cn/handle/1471x/62953

Idioma(s)

英语

Fonte

Wang, Y ; Wu, YD ; Li, JG ; Wang, HJ ; Hu, XW .Realization of MMI power splitter by UV-light imprinting technique using hybrid sol-gel SiO2 materials ,CHINESE PHYSICS LETTERS,2008 ,25(10): 3693-3695

Palavras-Chave #半导体物理 #GLASS WAVE-GUIDE #FABRICATION #SILICON
Tipo

期刊论文