Effect of SiO2 protective layer on the femtosecond laser-induced damage of HfO2/SiO2 multilayer high-reflective coatings


Autoria(s): Yuan Lei; Zhao Yuanan; Wang Congjuan; 贺洪波; 范正修; 邵建达
Data(s)

2007

Resumo

Two kinds of HfO2/SiO2 800 nm high-reflective (HR) coatings, with and without SiO2 protective layer were deposited by electron beam evaporation. Laser-induced damage thresholds (LIDT) were measured for all samples with femtosecond laser pulses. The surface morphologies and the depth information of all samples were observed by Leica optical microscopy and WYKO surface profiler, respectively. It is found that SiO2 protective layer had no positive effect on improving the LIDT of HR coating. A simple model including the conduction band electron production via multiphoton ionization and impact ionization is used to explain this phenomenon. Theoretical calculations show that the damage occurs first in the SiO2 protective layer for HfO2/SiO2 HR coating with SiO2 protective layer. The relation of LIDT for two kinds of HfO2/SiO2 HR coatings in calculation agrees with the experiment result. (c) 2006 Elsevier B.V. All rights reserved.

Identificador

http://ir.siom.ac.cn/handle/181231/4536

http://www.irgrid.ac.cn/handle/1471x/12845

Idioma(s)

英语

Fonte

Yuan Lei;Zhao Yuanan;Wang Congjuan;贺洪波;范正修;邵建达.,Appl. Surf. Sci.,2007,253(7):3450-3454

Palavras-Chave #光学薄膜 #femtosecond laser #SiO2 protective layer #HfO2/SiO2 #HR coating #laser-induced damage
Tipo

期刊论文