Super-resolution with a nonlinear thin film: Beam reshaping via internal multi-interference


Autoria(s): 魏劲松; Xiao Mufei; Zhang Feng
Data(s)

2006

Resumo

In laser applications, the size of the focus spot can be reduced beyond the diffraction limit with a thin film of strong nonlinear optical Kerr effect. We present a concise theoretical simulation of the device. The origin of the super-resolution is found to be mainly from the reshaping effect due to the strongly nonlinear refraction mediated multi-interference inside the thin film. In addition, both diffraction and self-focusing effects have been explored and found negligible for highly refractive and ultrathin films in comparison with the reshaping effect. Finally, the theoretic model has been verified in experiments with single Ge2Sb2Te5 film and SiN/Si/SiN/Ge2Sb2Te2 multilayer structures. (c) 2006 American Institute of Physics.

Identificador

http://ir.siom.ac.cn/handle/181231/3823

http://www.irgrid.ac.cn/handle/1471x/11291

Idioma(s)

英语

Fonte

魏劲松;Xiao Mufei;Zhang Feng.,Appl. Phys. Lett.,2006,89(22):223126-

Palavras-Chave #光存储 #DIFFRACTION LIMIT
Tipo

期刊论文