Development of high-power OPCPA laser at 1064 and 780 nm


Autoria(s): 冷雨欣; 梁晓燕; Zhao BZ; Wang C; Jiang YL; Yang XD; Lu HH; 林礼煌; Zhang ZQ; 李儒新; 徐至展
Data(s)

2006

Resumo

A compact 10-TW/100-fs level ultrashort-pulse and ultra-intense laser system at 1064 nm based on optical parametric chirped pulse amplification (OPCPA) scheme is described, at which the pump and seed for the optical parametric amplification (OPA) process is optically synchronized. We investigated the output stability and the conversion efficiency of the system. Moreover, a design toward higher peak power output is given and an optically synchronized amplifier based on the concept of OPCPA at 800 nm is preliminarily explored.

Identificador

http://ir.siom.ac.cn/handle/181231/806

http://www.irgrid.ac.cn/handle/1471x/9758

Idioma(s)

英语

Fonte

冷雨欣;梁晓燕;Zhao BZ;Wang C;Jiang YL;Yang XD;Lu HH;林礼煌;Zhang ZQ;李儒新;徐至展.,IEEE J. Sel. Top. Quantum Electron.,2006,12(2):187-193

Palavras-Chave #high-peak-power ultrashort-pulse laser #optical parametric chirped pulse amplification
Tipo

期刊论文