Realization of thermally durable close-packed 2D gold nanoparticle arrays using self-assembly and plasma etching


Autoria(s): Sivaraman, Sankar K; Santhanam, Venugopal
Data(s)

12/06/2012

Resumo

Realization of thermally and chemically durable, ordered gold nanostructures using bottom-up self-assembly techniques are essential for applications in a wide range of areas including catalysis, energy generation, and sensing. Herein, we describe a modular process for realizing uniform arrays of gold nanoparticles, with interparticle spacings of 2 nm and above, by using RF plasma etching to remove ligands from self-assembled arrays of ligand-coated gold nanoparticles. Both nanoscale imaging and macroscale spectroscopic characterization techniques were used to determine the optimal conditions for plasma etching, namely RF power, operating pressure, duration of treatment, and type of gas. We then studied the effect of nanoparticle size, interparticle spacing, and type of substrate on the thermal durability of plasma-treated and untreated nanoparticle arrays. Plasma-treated arrays showed enhanced chemical and thermal durability, on account of the removal of ligands. To illustrate the application potential of the developed process, robust SERS (surface-enhanced Raman scattering) substrates were formed using plasma-treated arrays of silver-coated gold nanoparticles that had a silicon wafer or photopaper as the underlying support. The measured value of the average SERS enhancement factor (2 x 10(5)) was quantitatively reproducible on both silicon and paper substrates. The silicon substrates gave quantitatively reproducible results even after thermal annealing. The paper-based SERS substrate was also used to swab and detect probe molecules deposited on a solid surface.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/44794/1/Nano%20Techonology_23_25_2012.pdf

Sivaraman, Sankar K and Santhanam, Venugopal (2012) Realization of thermally durable close-packed 2D gold nanoparticle arrays using self-assembly and plasma etching. In: NANOTECHNOLOGY, 23 (25).

Publicador

IOP PUBLISHING LTD

Relação

http://dx.doi.org/10.1088/0957-4484/23/25/255603

http://eprints.iisc.ernet.in/44794/

Palavras-Chave #Chemical Engineering
Tipo

Journal Article

PeerReviewed