Electrochemical Integration of Graphene with Light-Absorbing Copper-Based Thin Films


Autoria(s): Padmanabhan, Medini; Roy, Kallol; Ramalingam, Gopalakrishnan; Raghavan, Srinivasan; Ghosh, Arindam
Data(s)

12/01/2012

Resumo

We present an electrochemical route for the integration of graphene with light-sensitive copper-based alloys used in optoelectronic applications. Graphene grown using chemical vapor deposition (CVD) transferred to glass is found to be a robust substrate on which photoconductive CuxS films of 1-2 mu m thickness can be deposited. The effect of growth parameters on the morphology and photoconductivity of CuxS films is presented. Current-voltage (I-V) characterization and photoconductivity decay experiments are performed with graphene as one contact and silver epoxy as the other.

Formato

application/pdf

Identificador

http://eprints.iisc.ernet.in/43675/1/Electrochemical_Integration.pdf

Padmanabhan, Medini and Roy, Kallol and Ramalingam, Gopalakrishnan and Raghavan, Srinivasan and Ghosh, Arindam (2012) Electrochemical Integration of Graphene with Light-Absorbing Copper-Based Thin Films. In: The Journal of Physical Chemistry C, 116 (1). pp. 1200-1204.

Publicador

American Chemical Society

Relação

http://pubs.acs.org/doi/abs/10.1021/jp208120u

http://eprints.iisc.ernet.in/43675/

Palavras-Chave #Materials Research Centre #Physics
Tipo

Journal Article

PeerReviewed