Mechanism of 157 nm Photodegradation of Poly(4,5-Difluoro-2,2-bis(Trifluoromethyl)-1,3-Dioxole-co-Tetrafluoroethylene) (Teflon AF)
| Data(s) |
2007
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|---|---|
| Identificador | |
| Publicador |
American Chemical Society |
| Relação |
DOI:10.1021/ma071549m Blakey, Idriss, George, Graeme, Hill, David, Liu, Heping, Rasoul, Firas, Rintoul, Llewellyn, Zimmerman, Paul, & Whittaker, Andrew (2007) Mechanism of 157 nm Photodegradation of Poly(4,5-Difluoro-2,2-bis(Trifluoromethyl)-1,3-Dioxole-co-Tetrafluoroethylene) (Teflon AF). Macromolecules, 40(25), pp. 8954-8961. |
| Fonte |
Faculty of Science and Technology |
| Palavras-Chave | #030000 CHEMICAL SCIENCE #030300 MACROMOLECULAR AND MATERIALS CHEMISTRY #030304 Physical Chemistry of Materials #090000 ENGINEERING #Photodegradation, Teflon, Photolithography |
| Tipo |
Journal Article |
