XPS and 19F NMR Study of the Photodegradation at 157 nm of Photolithographic-Grade Teflon AF Thin Films
| Data(s) |
2005
|
|---|---|
| Identificador | |
| Publicador |
American Chemical Society |
| Relação |
Blakey, Idriss, George, Graeme, Hill, David, Liu, Heping, Rasoul, Firas, Whittaker, Andrew, & Zimmerman, Paul (2005) XPS and 19F NMR Study of the Photodegradation at 157 nm of Photolithographic-Grade Teflon AF Thin Films. Macromolecules, 38, pp. 4050-4053. |
| Fonte |
Faculty of Science and Technology |
| Palavras-Chave | #030300 MACROMOLECULAR AND MATERIALS CHEMISTRY |
| Tipo |
Journal Article |
